Semiconductor Industry

Precision temperature control is an essential component in Semiconductor manufacturing. As wafer technology continues to advance, the need for temperature accuracy becomes ever more crucial. Whether your process be material removal, deposition, growth, or testing, temperature plays a crucial role. In an industry dominated by efficiency, the same standard should be expected in your temperature control equipment.

Typical Applications

wafer etching

Wafer Etching

wafer etching

Chemical Vapor Deposition (CVD)

wafer etching

Physical Vapor Deposition (PVD)

Water baths for variable use in biological, medical or biochemical laboratories for temperatures from 25 to 100 °C. Shaking water baths from 10 to 99.9 °C for the lab.

The LAUDA Hydro series are optimally equipped for every application in the laboratory. These water baths ensure homogeneous temperature distribution without local overheating. High-quality stainless steel baths with precise temperature distribution and optional circulation.

Shaking water baths of the LAUDA Hydro series move samples in the laboratory with a linear or orbital shaking movement, depending on the model. LAUDA Hydro shaking water baths are reliable companions for continuous operation in daily laboratory work.

Application examples

  • Bacteriological examinations
  • Molecular biology
  • Demulsibility studies
  • Processing chemical reactions
  • Thawing
  • Metallurgical analysis
  • Incubation of microbiological assays
  • Warming Reagents
  • Environmental studies
  • Food processing (QC)
  • Water quality research
  • Cytochemistry
Working Temp Min.

Working temperature min.

25 °C

Working Temp Max.

Working temperature max.

100 °C

Efficiency Driven by Sustainability and Cost Savings
LAUDA-Noah SEMISTAT

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Eco-Friendly: Refrigerant free (reducing GWP), exploring non- PFAS fluid options for sustainability.

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Energy Efficient: Consumes less power than traditional units, minimizing operating costs.

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Minimal Fluid Usage: 2.5L fluid reservoir reduces consumption, thereby reducing operating cost.

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TE Technology: Operates efficiently, using power only under load.

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Maintenance Advantage: Virtually maintenance-free with a single moving part, the pump.

Lauda-NOAH Semistat

Water baths for variable use in biological, medical or biochemical laboratories for temperatures from 25 to 100 °C. Shaking water baths from 10 to 99.9 °C for the lab.

The LAUDA Hydro series are optimally equipped for every application in the laboratory. These water baths ensure homogeneous temperature distribution without local overheating. High-quality stainless steel baths with precise temperature distribution and optional circulation.

Shaking water baths of the LAUDA Hydro series move samples in the laboratory with a linear or orbital shaking movement, depending on the model. LAUDA Hydro shaking water baths are reliable companions for continuous operation in daily laboratory work.

Application examples

  • Bacteriological examinations
  • Molecular biology
  • Demulsibility studies
  • Processing chemical reactions
  • Thawing
  • Metallurgical analysis
  • Incubation of microbiological assays
  • Warming Reagents
  • Environmental studies
  • Food processing (QC)
  • Water quality research
  • Cytochemistry
Working Temp Min.

Working temperature min.

25 °C

Working Temp Max.

Working temperature max.

100 °C

Thermoelectric (TE) System

Thermoelectric (TE) systems are comprised of thermoelectric modules that are used to provide cooling and heating power for the systems.

Each module consists of p-type and n-type semiconductor pellets positioned between two ceramic plates. The pellets are connected in series electrically, and connected in parallel thermally. When a voltage is applied to a TE module, heat is transferred, or “pumped” from one side to the other. The effect is to rapidly cool one side and heat the other. Reversing polarity reverses the heat transfer direction, enabling a module to both heat and cool.

Key Characteristics and Benefits of Thermoelectric Systems:
  • No Moving Parts or Refrigerants: Enhancing reliability and reducing maintenance.
  • Scalable Cooling: Increase cooling capacity with added modules.
  • Efficient Control: Precisely regulating cooling and heating power through current modulation.
  • Responsive Temperature Adjustment: Rapidly adapt to process temperature changes.
  • Versatile Operation: Seamlessly transition between cooling and heating modes by changing polarity, eliminating the need for a heater.
Thermoelectric (TE) System

Dynamic Temperature Control

We use the term “dynamic” control because our equipment performs real-time temperature adjustments to the process fluid based on the return temperature from a process chamber’s wafer chuck (ESC). With our unit mounted ~6 ft from the chamber, we are able to get a much more accurate reading of the chuck temperature. This approach ensures consistent temperature throughout the production lot, and better wafer-to-wafer CD uniformity.

Advantages of Dynamic Temperature Control

  • Rapid Temperature Changes: Faster temperature ramp
    rates for higher chamber productivity.
  • Reduced First Wafer Effect: Quicker temperature response
    at the start of a lot (can even alleviate the need for a
    dummy wafer).
  • Wafer-to-Wafer Uniformity: Consistent processing
    outcomes across all wafers.
  • Compact Design: Occupies minimal space with sub-floor
    installation (nearly zero footprint).
  • Modular Design: Simplifies troubleshooting and reduces
    Mean Time to Repair (MTTR).

Static System

Static System

Dynamic System

Static System

Semiconductor NEWS & LAUDA BLOG:

Keep up to date with our products, industry news, and informational articles about different processing techniques available to processors.

If you’re interested in learning more about our temperature control solutions for semiconductor manufacturing, complete the form below to submit your inquiry and a LAUDA-Brinkmann representative will be in touch to discuss your needs.