by Jena Chu | Oct 19, 2023 | Semiconductor Industry
Process Details Process: Oxide Etch RF Power: 3.6kW (combined upper & lower electrode) Target Temperature (T Set-point): 20 °C at the lower electrode Chiller Comparison: OEM qualified compressor-based chiller vs. LAUDA-Noah POU system Data Acquisition System Setup...
by Jena Chu | Oct 18, 2023 | Industry Insights, Semiconductor Industry
In the realm of semiconductor manufacturing, precision and efficiency are critical. Temperature control within process chambers, especially the wafer chuck, is pivotal for consistent semiconductor fabrication. This post compares Dynamic Temperature Control and Static...
